M100

The M-100 is a compact ECR ion source designed to produce weakly charged ions.
With a permanent magnet magnetic structure, it operates at 2.45 GHz with RF injection.

The source is constituted within a single mechanical assembly:

• The plasma chamber with its adjustable-size output lens
• A gas inlet via a VCR connector
• A RF connector type N, ensuring the injection of microwave power at 2.45 GHz via a coaxial cable

The injection flange may also have an opening for attaching an Oven and injecting metal ions.
The cooled version (in picture) is optimized for higher ionic currents (>1 mA), it accepts up to 100 W of RF power at 2.45 GHz and requires cooling to maintain plasma stability.
The uncooled version is intended for applications requiring lower currents (~100µA).