Microgan

The Microgan is a robust ECR ion source designed to produce low charge state ions (1-6+) for industrial or high-usage applications.
The source features a permanent magnet magnetic structure, compatible with 10 GHz RF injection, and can operate up to 30kV of acceleration.

It consists of two mechanical assemblies:

• The source body with permanent magnets, the double-walled, water-cooled aluminum plasma chamber, and the adjustable-size plasma lens
• The injection cube combines : waveguide RF injection that accepts up to 200 W of RF power at 10 GHz, a port compatible with metal injection, and gas injection

The ion source also contains a DC Bias system which ensures better plasma confinement and improves performance